منابع مشابه
Silicon nitride deposited by ECR–CVD at room temperature for LOCOS isolation technology
For LOCOS application, silicon nitride (SiNx) insulators have been deposited by ECR–CVD at room temperature and with N2 flows of 2.5, 5, 10 and 20 sccm on pad-SiO2/Si or on Si substrates. The obtained SiNx/Si structures were used to analyze the SiNx characteristics. FTIR analyses reveal the presence of Si–N and N–H bonds. The refractive indexes between 1.88 and 2.48 and the thickness between 12...
متن کاملSterilisation by Ecr Plasma
Microwave plasma was built to produce plasma in axial direction. Plasma was initiated in a Plaxy Glass made vacuum tube by 2.45GHz commercial magnetron and meanwhile system was driven by 14 Amperes DC current passing through 16cm inner diameter toroid. Measurements with a Longmuir probe and ICCD for optical spectrometry were used to characterize internal parameters like electron density, electr...
متن کاملLow-pressure CVD and Plasma- Enhanced CVD
LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...
متن کاملCarrier properties of B atomic-layer-doped Si films grown by ECR Ar plasma-enhanced CVD without substrate heating
The atomic-layer (AL) doping technique in epitaxy has attracted attention as a low-resistive ultrathin semiconductor film as well as a two-dimensional (2-D) carrier transport system. In this paper, we report carrier properties for B AL-doped Si films with suppressed thermal diffusion. B AL-doped Si films were formed on Si(100) by B AL formation followed by Si cap layer deposition in low-energy ...
متن کاملCharacterization of a Waveguide ECR Plasma Source
The design and preliminary testing of a waveguide electron cyclotron resonance (ECR) heated plasma source is presented in this paper. The design utilizes resonant absorption of traveling microwaves to heat the discharge, avoiding any lifetime constraints on the device due to barium depletion or ion bombardment in more conventional devices. Results from magnetostatic calculations are presented, ...
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ژورنال
عنوان ژورنال: SHINKU
سال: 1988
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.31.279